In the high-growth color LCD field, a deposition method that allows processing to be carried out at the lowest possible temperature is now a major requirement for ITO film processing onto color filters.

We have established such a low temperature processing technology by further refining our originally developed sputtering method.

As a result, we are able to produce ITO film featuring comparatively low resistance at a temperature of less than 200 degree celsius (against 300 degree celsius in the case of conventional processing), and we have also realized the mass production of low-resistance ITO film onto color filters.

The specifications of the films are as follows.
< CLR II >
Resistance: 5.6 ohm/sq;
Film thickness: approx. 300nm;
Transmittance: 80%

< CLR I>
Resistance: 6.5 ohm/sq;
Film thickness: approx. 260nm;
Transmittance: 83%

< CLR-TFT >
Resistance: 15 orm/sq;
Film thickness: approx. 150nm;
Transmittance: 83%.

In the current situation in which sales of mobile information terminals represented by mobile phones, etc. are growing remarkably as an IT related industry, Sanyo Vacuum's anti-reflection film (AR Coat) is gathering widespread attention.

Since mobile information terminals are often used outdoor, such products are required to feature low external light reflectivity along with high visibility.

Accordingly, it is necessary to develop an anti-reflection film that controls the reflection of external light from the display surface. As a solution to this problem we are providing AR Coat, which is produced by sputtering deposition.

1. Deposition characteristics: Our anti-reflection film coating produced by sputtering is superior deposition characteristics compared when applied to resin, film substrate and large substrate.

2. Reliability: We produce AR Coat products based on each user's specifications, which means that our products are highly reliable.